US2017114449A1
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Physical vapor deposition system using rotating pallet with X and Y positioning
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US2017114447A1
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Physical vapor deposition system with target magnets controlled to only be above workpiece
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US2017114448A1
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Physical vapor deposition system using backside gas cooling of workpieces
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US2016111375A1
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Temporary bonding of packages to carrier for depositing metal layer for shielding
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US2010078312A1
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Sputtering Chamber Having ICP Coil and Targets on Top Wall
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US2010080928A1
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Confining Magnets In Sputtering Chamber
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TW200706691A
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Insulated pallet in cleaning chamber
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TW200704801A
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Multi-station sputtering and cleaning system
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KR20070121838A
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Sputtering system
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US2006231393A1
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Target backing plate for sputtering system
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US2006231383A1
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Oscillating magnet in sputtering system
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US2006231390A1
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Temperature control of pallet in sputtering system
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US2006231392A1
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Cross-contaminant shield in sputtering system
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US2006231391A1
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Top shield for sputtering system
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US2006231382A1
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Rotating pallet in sputtering system
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