Learn more

TOKYO ELECTRON CO LTD

Overview
  • Total Patents
    244
About

TOKYO ELECTRON CO LTD has a total of 244 patent applications. Its first patent ever was published in 1988. It filed its patents most often in Taiwan, China and Republic of Korea. Its main competitors in its focus markets semiconductors, surface technology and coating and machines are MACHINE TECHNOLOGY INC, MACH TECHNOL INC and APPLIED KOMATSU TECHNOLOGY INC.

Patent filings in countries

World map showing TOKYO ELECTRON CO LTDs patent filings in countries
# Country Total Patents
#1 Taiwan 196
#2 China 25
#3 Republic of Korea 22
#4 United States 1

Patent filings per year

Chart showing TOKYO ELECTRON CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Arai Izumi 3
#2 Motoda Kimio 3
#3 Matsuyama Yuji 3
#4 Iwai Hiroyuki 2
#5 Aoki Makoto 2
#6 Yaegashi Hidetami 2
#7 Tahara Yoshifumi 2
#8 Kawasaki Tetsu 2
#9 Nakao Masaru 2
#10 Haraoka Tsutomu 2

Latest patents

Publication Filing date Title
TW200908076A Plasma processing system and use of plasma processing system
CN1783430A Capacitive coupling plasma processing apparatus
CN1642665A Removal of contaminants using supercritical processing
CN1480995A Plasma processing appts, and its processing method
KR20000012023A Substrate process method and substrate process apparatus
TW346649B Method for wet etching a film
TW331550B The cassette receiving room
TW344847B Substrate treatment system, substrate transfer system, and substrate transfer method
TW345687B Film forming device, film modification device, film forming method and film modification method
TW333658B The substrate processing method and substrate processing system
TW344097B Photoresist treating device of substrate and photoresist treating method
TW326548B Substrate drying apparatus and method for drying a substrate
TW300954B The probe card used in prober
TW338174B Apparatus for supplying a treatment material
TW328067B Substrate processing device and transporter using such a device
TW275132B Treatment apparatus
TW270224B Probe apparatus
TW267245B Probe apparatus
TW258820B Process of membrane formation
KR0156011B1 Plasma treating apparatus and method thereof