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APPLIED KOMATSU TECHNOLOGY INC

Overview
  • Total Patents
    144
About

APPLIED KOMATSU TECHNOLOGY INC has a total of 144 patent applications. Its first patent ever was published in 1994. It filed its patents most often in United States, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, surface technology and coating and machines are MACH TECHNOL INC, APPLIED MATERIALS INC and MACHINE TECHNOLOGY INC.

Patent filings per year

Chart showing APPLIED KOMATSU TECHNOLOGY INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 White John M 45
#2 Law Kam S 34
#3 Blonigan Wendell T 32
#4 Shang Quanyuan 23
#5 Kurita Shinichi 15
#6 Beer Emanuel 15
#7 Turner Norman L 14
#8 Hosokawa Akihiro 12
#9 Richter Michael W 11
#10 Wong Yuen-Kui 10

Latest patents

Publication Filing date Title
TW467970B Aluminum-neodymium etch process with hydrogen iodide
TW524877B Method and apparatus for enhanced chamber cleaning
FR2805080A1 Method for depositing films on amorphous silicon base having adjusted conductivity, for use in improved field-effect display devices
TW525228B Method of depositing amorphous silicon based films having controlled conductivity
US6267851B1 Tilted sputtering target with shield to block contaminants
US6149365A Support frame for substrates
US6472329B1 Etching aluminum over refractory metal with successive plasmas
TW585929B Collimated sputtering of semiconductor and other films
TW434636B RF matching network with distributed outputs
US6355108B1 Film deposition using a finger type shadow frame
US6352910B1 Method of depositing amorphous silicon based films having controlled conductivity
TW494143B Annealing an amorphous film using microwave energy
WO9906611A1 Method and apparatus for chamber cleaning
US6016611A Gas flow control in a substrate processing system
US6225601B1 Heating a substrate support in a substrate handling chamber
US6182603B1 Surface-treated shower head for use in a substrate processing chamber
WO9859380A1 Dry-etching of thin film layers
WO9859379A1 Dry-etching of indium and tin oxides
US6204607B1 Plasma source with multiple magnetic flux sources each having a ferromagnetic core
US6079693A Isolation valves