TECHNEGLAS INC has a total of 17 patent applications. Its first patent ever was published in 1992. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets semiconductors, materials and metallurgy and surface technology and coating are SHIKUSUON KK, NORSTEL AB and BEIJING TONGMEI XTAL TECHNOLOGY CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 7 | |
#2 | WIPO (World Intellectual Property Organization) | 3 | |
#3 | China | 2 | |
#4 | EPO (European Patent Office) | 2 | |
#5 | Australia | 1 | |
#6 | Mexico | 1 | |
#7 | Malaysia | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Materials and metallurgy | |
#3 | Surface technology and coating | |
#4 | Machines |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Single-crystal-growth | |
#3 | Treatment of glass | |
#4 | Unspecified technologies |
# | Name | Total Patents |
---|---|---|
#1 | Rapp James E | 8 |
#2 | Rogenski Russell B | 4 |
#3 | Pickrell Gary R | 4 |
#4 | Peer Joseph | 3 |
#5 | Bobinski Jon | 3 |
#6 | Peer J | 1 |
#7 | Peer Joseph V | 1 |
#8 | Hudecek Carl J | 1 |
#9 | Rogenski J E Rapp R B | 1 |
#10 | Bobinski Jon G | 1 |
Publication | Filing date | Title |
---|---|---|
US6461948B1 | Method of doping silicon with phosphorus and growing oxide on silicon in the presence of steam | |
US6245699B1 | High strength sealing glass | |
CN1194630A | Sealing glass modifier for use with voc-free or low-voc rehicle | |
WO9736836A1 | Sealing glass modifier for use with voc-free or low-voc vehicle | |
US6248679B1 | Low temperature sealing glass | |
US5350460A | High temperature phosphorus oxide diffusion source | |
US5350461A | Low temperature P2 O5 oxide diffusion source |