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SUMITOMO HEAVY IND ION TECHNOLOGY CO LTD

Overview
  • Total Patents
    42
  • GoodIP Patent Rank
    45,045
About

SUMITOMO HEAVY IND ION TECHNOLOGY CO LTD has a total of 42 patent applications. Its first patent ever was published in 2011. It filed its patents most often in Japan, United States and Republic of Korea. Its main competitors in its focus markets electrical machinery and energy, semiconductors and surface technology and coating are SUPERION LTD, SEN CORP AN SHI AND AXCELIS COMPANY and CARL ZEISS MICROSCOPY LLC.

Patent filings in countries

World map showing SUMITOMO HEAVY IND ION TECHNOLOGY CO LTDs patent filings in countries
# Country Total Patents
#1 Japan 19
#2 United States 15
#3 Republic of Korea 3
#4 Taiwan 3
#5 China 2

Patent filings per year

Chart showing SUMITOMO HEAVY IND ION TECHNOLOGY CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kabasawa Mitsuaki 11
#2 Watanabe Kazuhiro 7
#3 Amano Yoshitaka 6
#4 Ninomiya Shiro 6
#5 Yakida Takanori 5
#6 Sasaki Haruka 5
#7 Sato Masateru 5
#8 Yagita Takanori 4
#9 Inada Kouji 4
#10 Yumiyama Toshio 4

Latest patents

Publication Filing date Title
JP2015173116A Ion implantation device and ion implantation method
JP2016039092A Ion injection device, ion injection method and beam measurement device
JP2016018707A Ion injection apparatus and control method for ion injection apparatus
JP2016009551A Ion implantation device
JP2016004898A Ion implantation device and control method for the same
JP2016004614A Beam irradiation device and beam irradiation method
JP2015232947A Ion injection device and ion injection method
JP2015225708A Ion implantation device
JP2015225707A Ion implantation device
JP2015225720A Ion generator and thermionic emission section
JP2015210951A Ion implantation method and ion implantation device
JP2015207536A Ion implantation device and method
JP2015191740A Ion implantation device, final energy filter, and ion implantation method
JP2015176750A Ion injection device, beam energy measurement device, and beam energy measurement method
JP2015153468A High-energy ion implantation apparatus, beam parallelizer and beam parallelizing method
JP2015141834A Ion implantation device, and method of controlling the same
JP2015125827A Support structure and ion generator using the same
JP2015115172A Antenna cover and plasma generation device using the same
JP2015106518A Ion implantation device