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STEAG RTP SYSTEMS GMBH

Overview
  • Total Patents
    100
About

STEAG RTP SYSTEMS GMBH has a total of 100 patent applications. Its first patent ever was published in 1994. It filed its patents most often in EPO (European Patent Office), Taiwan and Germany. Its main competitors in its focus markets semiconductors, surface technology and coating and measurement are CENTROTHERM THERMAL SOLUTIONS GMBH & CO KG, STEAG AST ELEKTRONIK GMBH and STEAG RTP SYSTEMS INC.

Patent filings in countries

World map showing STEAG RTP SYSTEMS GMBHs patent filings in countries

Patent filings per year

Chart showing STEAG RTP SYSTEMS GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hauf Markus 22
#2 Lerch Wilfried 22
#3 Walk Heinrich 19
#4 Aschner Helmut 13
#5 Blersch Werner 13
#6 Zernickel Dieter 12
#7 Nenyei Zsolt 10
#8 Kreiser Uwe 10
#9 Schmid Patrick 10
#10 Marcus Steven D 9

Latest patents

Publication Filing date Title
DE10051125A1 Device for the thermal treatment of substrates
DE10032465A1 Method and device for the thermal treatment of objects
DE10026180A1 Apparatus for coating a semiconductor wafer in the production of microelectronics has a gas inlet system for introducing process gases into the process chamber via inlets
DE10024709A1 Device for the thermal treatment of substrates
DE10024710A1 Setting defect profiles in crystals or crystal-like structures
EP1175696A2 Method for generating defects in a grid support of a semiconductor material
DE10008829A1 Method of removing adsorbed molecules from a chamber
DE10003639A1 Device for the thermal treatment of substrates
EP1155437A1 Cooled showerhead for rapid thermal processing (rtp) system
WO0036635A1 Gas driven rotating susceptor for rapid thermal processing (rtp) system
DE19957758A1 Device and method for aligning disc-shaped substrates
DE19952374A1 Lamp for heating devices used for thermal treatment of semiconductor substrates has cylindrical glass body with base at each end of glass body
DE19952015A1 Process for the thermal treatment of objects
DE19952017A1 Method and device for the thermal treatment of substrates
TW403835B The method of temperature measurement used in calibration regardless of the emitting rate and the apparatus thereof
DE19927962A1 Method for generating defects in a lattice structure of a semiconductor material
WO9966548A1 Method for determining parameter distributions of object properties
DE19923400A1 Device and method for the thermal treatment of substrates
DE19920871A1 Process for activating charge carriers by radiation-assisted heat treatment
DE19913922A1 Method for determining parameter distributions of substrate properties