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STEAG RTP SYSTEMS INC

Overview
  • Total Patents
    45
About

STEAG RTP SYSTEMS INC has a total of 45 patent applications. Its first patent ever was published in 1996. It filed its patents most often in United States, EPO (European Patent Office) and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, measurement and thermal processes are GMEMS CO LTD, SEMI CONDUCTOR DEVICES AN ELBIT SYSTEMS RAFAEL PARTNERSHIP and STRATIO.

Patent filings in countries

World map showing STEAG RTP SYSTEMS INCs patent filings in countries

Patent filings per year

Chart showing STEAG RTP SYSTEMS INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Gat Arnon 11
#2 Hu Yao Zhi 10
#3 Tay Sing Pin 10
#4 Thakur Randhir P S 8
#5 Thakur Randhir 7
#6 Guardado Julio 5
#7 Das John H 5
#8 Sharangpani Rahul 4
#9 Hathaway Kevin 4
#10 Bragg Chris Francis 3

Latest patents

Publication Filing date Title
US6514876B1 Pre-metal dielectric rapid thermal processing for sub-micron technology
WO0113426A1 Method of producing copper features on semiconductor wafers
EP1138059A1 Rapid thermal processing chamber for processing multiple wafers
EP1142001A1 Fast heating and cooling apparatus for semiconductor wafers
US6359263B2 System for controlling the temperature of a reflective substrate during rapid heating
US6293696B1 System and process for calibrating pyrometers in thermal processing chambers
US6200023B1 Method for determining the temperature in a thermal processing chamber
US6221766B1 Method and apparatus for processing refractory metals on semiconductor substrates
US6281141B1 Process for forming thin dielectric layers in semiconductor devices
US6174651B1 Method for depositing atomized materials onto a substrate utilizing light exposure for heating
US6210484B1 Heating device containing a multi-lamp cone for heating semiconductor wafers
US6034357A Apparatus and process for measuring the temperature of semiconductor wafers in the presence of radiation absorbing gases
US6204484B1 System for measuring the temperature of a semiconductor wafer during thermal processing
US6056434A Apparatus and method for determining the temperature of objects in thermal processing chambers
US6075922A Process for preventing gas leaks in an atmospheric thermal processing chamber
US6027244A Apparatus for determining the temperature of a semi-transparent radiating body
US5980637A System for depositing a material on a substrate using light energy