SIPEC CORP has a total of 36 patent applications. Its first patent ever was published in 1999. It filed its patents most often in United States, EPO (European Patent Office) and China. Its main competitors in its focus markets semiconductors, chemical engineering and optics are AKRION LLC, UCT KK and FSI INT INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 10 | |
#2 | EPO (European Patent Office) | 6 | |
#3 | China | 5 | |
#4 | Japan | 4 | |
#5 | Taiwan | 4 | |
#6 | WIPO (World Intellectual Property Organization) | 4 | |
#7 | Israel | 1 | |
#8 | Republic of Korea | 1 | |
#9 | Singapore | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Chemical engineering | |
#3 | Optics | |
#4 | Engines, pumps and turbines | |
#5 | Machines | |
#6 | Control | |
#7 | Mechanical elements |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Cleaning | |
#3 | Photomechanical semiconductor production | |
#4 | Unspecified technologies | |
#5 | Mixing | |
#6 | Siphons | |
#7 | Systems controlling non-electric variables | |
#8 | Pumps | |
#9 | Venting or aerating devices | |
#10 | Chemical or physical processes |
# | Name | Total Patents |
---|---|---|
#1 | Endo Tamio | 9 |
#2 | Yoshida Tatsuro | 9 |
#3 | Matsuzawa Minoru | 9 |
#4 | Miki Nobuhiro | 8 |
#5 | Nitta Takahisa | 8 |
#6 | Sato Atsushi | 5 |
#7 | Amano Yasuhiko | 5 |
#8 | Tamura Tetsuji | 4 |
#9 | Okura Ryoichi | 4 |
#10 | Yamaguchi Yoshiaki | 4 |
Publication | Filing date | Title |
---|---|---|
CN1930667A | Substrate processing equipment | |
JP2005051028A | Substrate supporting device and substrate removing method | |
JP2004213267A | Device and method for optimization designing of integrated circuit and storage medium storing program for performing optimization designing of integrated circuit | |
EP1499106A1 | Image data compression device, image data compression method, recording medium, and program | |
JP2004079569A | Substrate transport apparatus and substrate transport method | |
JP2004031400A | Equipment for processing substrate and method therefor | |
US6610168B1 | Resist film removal apparatus and resist film removal method | |
US6503464B1 | Ultraviolet processing apparatus and ultraviolet processing method | |
US6630031B1 | Surface purification apparatus and surface purification method |