| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 10 | |
| #2 | WIPO (World Intellectual Property Organization) | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Chemical engineering | |
| #3 | Machines | |
| #4 | Electrical machinery and energy | |
| #5 | Basic materials chemistry |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Unspecified technologies | |
| #3 | Cleaning | |
| #4 | Mixing | |
| #5 | Unspecified technologies | |
| #6 | Electric discharge tubes | |
| #7 | Soaps |
| # | Name | Total Patents |
|---|---|---|
| #1 | Kholodenko Arnold | 11 |
| #2 | Lin Cheng-Yu Sean | 8 |
| #3 | Husain Anwar | 5 |
| #4 | Ginzburg Leon | 4 |
| #5 | Tomasch Gregory A | 4 |
| #6 | Mikhaylichenko Katrina | 2 |
| #7 | Kawaguchi Mark | 2 |
| #8 | Wilcoxson Mark | 2 |
| #9 | Mandelboym Mark | 2 |
| #10 | Ginzburg Leonid | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US2011100399A1 | In situ morphological characterization of foam for a proximity head | |
| US2010288311A1 | Multi-stage substrate cleaning method and apparatus | |
| US2010037922A1 | Apparatus for substantially uniform fluid flow rates relative to a proximity head in processing of a wafer surface by a meniscus | |
| US2010126528A1 | Confinement of foam delivered by a proximity head | |
| US2010024842A1 | Generator for foam to clean substrate | |
| US2009320942A1 | Single substrate processing head for particle removal using low viscosity fluid |