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FSI INT INC

Overview
  • Total Patents
    305
About

FSI INT INC has a total of 305 patent applications. Its first patent ever was published in 1986. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets semiconductors, machines and chemical engineering are RYODEN SEMICONDUCTOR SYST ENG, MATTSON WET PRODUCTS GMBH and MIYA KATSUHIKO.

Patent filings per year

Chart showing FSI INT INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Christenson Kurt K 39
#2 Wagener Thomas J 34
#3 Siefering Kevin L 23
#4 Gast Tracy A 23
#5 Rose Alan D 21
#6 Collins Jimmy D 20
#7 Butterbaugh Jeffery W 19
#8 Fayfield Robert T 19
#9 Dekraker David 18
#10 Ramanan Natarajan 16

Latest patents

Publication Filing date Title
WO2013003013A1 Acid treatment strategies useful to fabricate microelectronic devices and precursors thereof
KR20130083380A Methodologies for rising tool surfaces in tools used to process microelectronic workpieces
CN102834182A Wet processing of microelectronic substrates with controlled mixing of fluids proximal to substrate surfaces
US2010124410A1 System for supplying water vapor in semiconductor wafer treatment
US2009304995A1 Hydrophilic fluoropolymer materials and methods
TW201003822A Substrate processing systems and related methods
KR20110005699A Tools and methods for processing microelectronic workpices using process chamber designs that easily transition between open and closed modes of operation
WO2009139816A1 Process for treatment of semiconductor wafer using water vapor containing environment
CN101802975A Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatuses
CN101681827A Process for treatment of substrates with water vapor or steam
CN101495248A Liquid aersol particle removal method
CN101484974A Barrier structure, device and method to process microelectronic workpieces
KR20090130197A Process for removing material from substrates
US2007001638A1 Robot with vibration sensor device
WO2006130439A1 Process for removal of metals and alloys from a substrate
US2007257011A1 Advanced process control for low variation treatment in immersion processing
WO2006107569A2 Methods for rinsing microelectronic substrates utilizing cool rinse fluid within a gas environment including a drying enhancement substance
US2007022948A1 Compact duct system incorporating moveable and nestable baffles for use in tools used to process microelectronic workpieces with one or more treatment fluids
US2006128133A1 Reagent activator for electroless plating
WO2006055345A1 Nozzle design for generating fluid streams useful in the manufacture of microelectronic devices