SHIN-ETSU HANDOTAI CO LTD has a total of 277 patent applications. It decreased the IP activity by 91.0%. Its first patent ever was published in 2001. It filed its patents most often in WIPO (World Intellectual Property Organization), Taiwan and United States. Its main competitors in its focus markets semiconductors, machine tools and surface technology and coating are SHIN ETSU HANDOTAI CO LTD, SHINETSU HANDOTAI CO LTD and SK SILTRON CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | WIPO (World Intellectual Property Organization) | 69 | |
#2 | Taiwan | 49 | |
#3 | United States | 47 | |
#4 | Republic of Korea | 45 | |
#5 | China | 30 | |
#6 | EPO (European Patent Office) | 26 | |
#7 | Singapore | 11 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Machine tools | |
#3 | Surface technology and coating | |
#4 | Measurement | |
#5 | Machines | |
#6 | Environmental technology | |
#7 | Basic materials chemistry |
# | Name | Total Patents |
---|---|---|
#1 | Aga Hiroji | 30 |
#2 | Kobayashi Norihiro | 23 |
#3 | Sato Michito | 20 |
#4 | Hoshi Ryoji | 15 |
#5 | Tanaka Yuki | 13 |
#6 | Ohtsuki Tsuyoshi | 12 |
#7 | Takeno Hiroshi | 11 |
#8 | Yasuda Taichi | 11 |
#9 | Ishii Kaoru | 11 |
#10 | Yokokawa Isao | 11 |
Publication | Filing date | Title |
---|---|---|
WO2017150114A1 | Polishing composition | |
WO2017141299A1 | Film-thickness-distribution measuring method | |
KR20170063560A | Semiconductor single crystal pulling apparatus and method for remelting semiconductor single crystal using same |