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SHANGHAI ADVANCED SILICON TECH CO LTD

Overview
  • Total Patents
    41
  • GoodIP Patent Rank
    37,737
  • Filing trend
    ⇧ 100.0%
About

SHANGHAI ADVANCED SILICON TECH CO LTD has a total of 41 patent applications. It increased the IP activity by 100.0%. Its first patent ever was published in 2014. It filed its patents most often in China. Its main competitors in its focus markets surface technology and coating, machine tools and semiconductors are SHANGHAI WAFER WORKS CORP, TIANTONG YINSHA NEW MAT CO LTD and SICRYSTAL GMBH.

Patent filings in countries

World map showing SHANGHAI ADVANCED SILICON TECH CO LTDs patent filings in countries
# Country Total Patents
#1 China 41

Patent filings per year

Chart showing SHANGHAI ADVANCED SILICON TECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Chen Meng 32
#2 Song Hongwei 29
#3 Shen Siqing 23
#4 Zhang Junbao 23
#5 Liu Pufeng 17
#6 Sun Qiang 7
#7 Xu Wei 5
#8 Li Qinlin 5
#9 Bai Yourong 5
#10 Shen Beiying 2

Latest patents

Publication Filing date Title
CN111136579A Guiding mechanism and polishing equipment
CN110900438A Wafer polishing device and method
CN110813604A Preparation device and preparation method of silicon wafer particle standard wafer
CN110682204A Unloading device and chemical mechanical polishing auxiliary equipment
CN109352513A A kind of polishing wafer method
CN109280974A A kind of preparation method of large scale YAG laser crystal
CN109338472A A method of eliminating YAG laser crystal tail portion cracking
CN109524322A A kind of correction silicon wafer, preparation method and application
CN109530374A A kind of wafer cassette cleaning method
CN109374633A A kind of detection method of sapphire wafer defect
CN109461653A It is a kind of to return the stripping means for throwing silicon wafer metallic diaphragm
CN109187580A A kind of detection method of silicon polished defect
CN108051347A A kind of method for detection storage silicon chip nitrogen cabinet internal environment particle
CN107946179A A kind of recovery method of the graphical wafer formed with integrated circuit and polycrystal layer
CN107993921A Curing means and maintaining process after a kind of wafer polishing
CN107243821A A kind of single-sided polishing method of sapphire substrate sheet
CN107604431A N-type monocrystalline silicon manufacturing method and apparatus
CN107604430A Low oxygen content monocrystalline silicon growing method
CN105887194A Growth method of type-n monocrystalline silicon
CN105970284A P type monocrystalline silicon piece and manufacturing method thereof