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CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD

Overview
  • Total Patents
    88
  • GoodIP Patent Rank
    16,303
  • Filing trend
    ⇧ 3.0%
About

CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD has a total of 88 patent applications. It increased the IP activity by 3.0%. Its first patent ever was published in 2014. It filed its patents most often in China, WIPO (World Intellectual Property Organization) and Republic of Korea. Its main competitors in its focus markets organic fine chemistry, macromolecular chemistry and polymers and optics are INSIGHT HIGH TECHNOLOGY CO LTD, CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD and CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO LTD.

Patent filings per year

Chart showing CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Qian Xiaochun 83
#2 Hu Chunqing 50
#3 Yu Peipei 21
#4 Jin Xiaobei 16
#5 Ma Lijun 4
#6 Ge Qingyu 2
#7 Cheng Ruwen 2
#8 Gong Yan 1
#9 Ma Peipei 1
#10 Sun Kejiang 1

Latest patents

Publication Filing date Title
WO2021078230A1 Photo-curing resin, photo-curing resin composition and black matrix material
WO2021057862A1 Sulfimide photo acid generator capable of efficiently generating acid at i-ray, photosensitive composition and preparation method therefor, pattern forming method, and applications of sulfimide photo acid generator and photosensitive composition
WO2021057813A1 Sulfimide photo-acid generator, photosensitive resin composition, patterning method, use of photosensitive resin composition
WO2020238862A1 Fluorene initiator, photocurable composition comprising same, and application thereof
CN111413849A Photosensitive composition, preparation method thereof, pattern forming method and application
WO2020073822A1 Triphenylphosphonium salt compound, and uses thereof
CN112010997A Fluorene photoinitiator, preparation method thereof, photocuring composition containing fluorene photoinitiator and application of fluorene photoinitiator in photocuring field
CN112010788A Non-ionic oxime ester photo-acid generator
CN111909118A Oxetane compound, photocurable composition, ink and use thereof
CN111694215A Photoresist composition and method for forming photolithographic pattern
CN111690308A Energy-curable composition and use thereof in the field of energy curing
CN111320714A Oxime ester photoinitiator, preparation method and application thereof
CN111324009A Photocurable composition and use thereof
KR20200101429A Fluorine-containing fluorene oxime ester photoinitiator, photocurable composition comprising same, and use thereof
CN111221215A Photosensitive resin composition and application thereof
CN111061126A Photoresist and method for forming photoetching pattern
CN111061125A Photoresist and application thereof
CN111018763A Bis-triphenyl sulfonium salt compound and application thereof
CN111018764A Triphenylsulfonium salt compound and application thereof
CN110824836A Cationic photocurable composition and application thereof