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ROHM & HAAS ELECT MATERIALS

Overview
  • Total Patents
    5,693
  • GoodIP Patent Rank
    780
  • Filing trend
    ⇩ 16.0%
About

ROHM & HAAS ELECT MATERIALS has a total of 5,693 patent applications. It decreased the IP activity by 16.0%. Its first patent ever was published in 1997. It filed its patents most often in Republic of Korea, Japan and Taiwan. Its main competitors in its focus markets semiconductors, optics and basic materials chemistry are ROHM & HAAS ELECT MAT, ROHM & HAAS ELECTRONIC MAT KOREA LTD and DONGJIN SEMICHEM CO LTD.

Patent filings per year

Chart showing ROHM & HAAS ELECT MATERIALSs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Wang Deyan 300
#2 Li Mingqi 258
#3 Liu Cong 237
#4 Lee Kyung-Joo 210
#5 Xu Cheng-Bai 210
#6 Kim Bong-Ok 192
#7 Aqad Emad 188
#8 Gallagher Michael K 188
#9 Kwon Hyuck-Joo 183
#10 Cho Young-Jun 164

Latest patents

Publication Filing date Title
US2021115581A1 Method of enhancing copper electroplating
US2021115582A1 Acid aqueous binary silver-bismuth alloy electroplating compositions and methods
US2021017308A1 Polymers for display devices
TW202100607A Gas sensors and methods of sensing a gas-phase analyte
CN112011008A Resist composition, method of manufacturing the same, and article including the same
US2020379351A1 Photoresist pattern trimming compositions and pattern formation methods
US2020379353A1 Photoresist pattern trimming compositions and pattern formation methods
US2020388943A1 Press-fit terminal with improved whisker inhibition
JP2020134941A Anti-reflective coating
US2021108324A1 Acidic aqueous silver-nickel alloy electroplating compositions and methods
US2021108065A1 Polymers and photoresist compositions
US2020142309A1 Aromatic underlayer
US2020181787A1 Methods of generating manganese (III) ions in mixed aqueous acid solutions using ozone
US2020348592A1 Resist underlayer compositions and methods of forming patterns with such compositions
US2020058494A1 Aromatic underlayer
US2020004152A1 Photoresist topcoat compositions and methods of processing photoresist compositions
US2020379347A1 Resist underlayer compositions and pattern formation methods using such compositions
US2020356001A1 Photoresist compositions and methods of forming resist patterns with such compositions
US2019382161A1 Containers with active surface and methods of forming such containers
US2019382901A1 Electroless copper plating compositions and methods for electroless plating copper on substrates