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HITACHI CHEM DUPONT MICROSYS

Overview
  • Total Patents
    409
  • GoodIP Patent Rank
    54,361
About

HITACHI CHEM DUPONT MICROSYS has a total of 409 patent applications. Its first patent ever was published in 1998. It filed its patents most often in Japan, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets macromolecular chemistry and polymers, optics and semiconductors are AZ ELECTRONIC MATERIALS KK, WINS KK and HONGLI SEMICONDUCTOR MFG CO.

Patent filings per year

Chart showing HITACHI CHEM DUPONT MICROSYSs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Minegishi Tomonori 85
#2 Oe Tadayuki 44
#3 Suzuki Keiko 42
#4 Enomoto Tetsuya 39
#5 Yamazaki Noriyuki 36
#6 Komatsu Hiroshi 34
#7 Kaji Makoto 33
#8 Ooe Masayuki 30
#9 Ono Keishi 29
#10 Nunomura Masataka 28

Latest patents

Publication Filing date Title
WO2016121376A1 Positive photosensitive resin composition, method of manufacturing pattern cured film, interlayer insulation film, covercoat layer or surface protection film, and electronic component
CN107430334A Positive type photosensitive organic compound, the manufacture method of pattern cured film, pattern cured film and electronic unit
JP2015178628A Polyimide precursor resin composition for forming flexible device substrate, and manufacturing method of flexible device using the same, and flexible device
CN106462057A Resin composition, cured film and patterned cured film formed from same, method for producing cured film, and method for producing patterned cured film
JP2015127817A Photosensitive resin composition and circuit formation substrate using the same
WO2016121035A1 Positive photosensitive resin composition, method for producing patterned cured film, interlayer insulating film, cover coat layer, surface protection film and electronic component
WO2015118836A1 Resin composition containing polyimide precursor, method for manufacturing cured film, and electronic component
KR20160086324A Resin composition containing polyimide precursor and method for manufacturing cured film using said resin composition
WO2015011893A1 Resin composition, method for forming pattern using same, and electronic component
JP2016008992A Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component
JP2015224261A Resin composition comprising polyimide precursor, cured film, and production method thereof
JP2015219491A Polyimide precursor, photosensitive resin composition containing the polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using the same
JP2015213863A Cured film production method
JP2015200819A Positive photosensitive resin composition, patterned cured film using the same, and production method thereof
JP2015151404A Resin composition containing polyimide precursor, cured film and manufacturing method therefor
JP2015151405A Resin composition containing polyimide precursor, manufacturing method of cured membrane and electronic component
JP2015147907A Resin composition, method of producing cured film using resin composition and electronic component
JP2015141352A Photosensitive resin composition and production method of patterned cured film using the same
JP2015129791A Positive photosensitive resin composition and method of producing patterned cured film using the same
WO2014115233A1 Resin composition, method for manufacturing pattern cured film, and semiconductor element