| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 12 | |
| #2 | WIPO (World Intellectual Property Organization) | 12 | |
| #3 | Singapore | 7 | |
| #4 | Malaysia | 3 | |
| #5 | EPO (European Patent Office) | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Semiconductors | |
| #3 | Macromolecular chemistry and polymers | |
| #4 | Basic materials chemistry | |
| #5 | Surface technology and coating | |
| #6 | Machines | |
| #7 | Materials and metallurgy |
| # | Name | Total Patents |
|---|---|---|
| #1 | Nagahara Tatsuro | 9 |
| #2 | Sekito Takashi | 7 |
| #3 | Fuke Takashi | 5 |
| #4 | Yokoyama Daishi | 5 |
| #5 | Tashiro Yuji | 5 |
| #6 | Pawlowski Georg | 5 |
| #7 | Nonaka Toshiaki | 5 |
| #8 | Ishii Masahiro | 5 |
| #9 | Tanaka Yasuaki | 5 |
| #10 | Takano Yusuke | 5 |
| Publication | Filing date | Title |
|---|---|---|
| WO2012176291A1 | Method for forming silicon oxynitride film, and substrate having silicon oxynitride film produced using this formation method |