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AZ ELECTRONIC MATERIALS KK

Overview
  • Total Patents
    61
About

AZ ELECTRONIC MATERIALS KK has a total of 61 patent applications. Its first patent ever was published in 2003. It filed its patents most often in Japan. Its main competitors in its focus markets semiconductors, optics and basic materials chemistry are KOZAWA MIWA, YAMAMOTO KEI and AZ ELECTRONIC MATERIALS IP JAPAN K K.

Patent filings in countries

World map showing AZ ELECTRONIC MATERIALS KKs patent filings in countries
# Country Total Patents
#1 Japan 61

Patent filings per year

Chart showing AZ ELECTRONIC MATERIALS KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Nagahara Tatsuro 9
#2 Takano Yusuke 8
#3 Noya Takeshi 7
#4 Kobayashi Masaichi 7
#5 Sekito Takashi 5
#6 Akiyama Yasushi 5
#7 Ishikawa Tomonori 5
#8 Takahashi Shuichi 5
#9 Shimazaki Ryuta 5
#10 Ichiyama Masaaki 5

Latest patents

Publication Filing date Title
JP2012099753A Method of forming isolation structure
JP2012062098A Liquid container and method for assembling the same
JP2012042531A Rinse liquid for lithography, and pattern formation method utilizing the same
JP2012004349A Forming method of silicon oxynitride film and substrate with silicon oxynitride film manufactured using the same
JP2011142207A Coating composition including polysilazane
JP2011054898A Method for manufacturing siliceous film and polysilazane coating film treatment liquid to be used for the method
JP2010250118A Fine pattern forming method
JP2010175828A Photosensitive resin composition and method for forming pattern
JP2010128464A Method for forming resist pattern
JP2010072323A Photosensitive resin composition for slit coating
JP2010072072A Substrate processing liquid and method for processing resist substrate using the same
JP2010043030A Alkali-soluble silsesquioxane and photosensitive composition
JP2010043200A Alkali-soluble silsesquioxane and photosensitive composition
JP2010039260A Coating composition suitable to be layered on resist layer
JP2010003983A Shallow trench isolation structure, and formation method thereof
JP2009221250A Ink composition for highly precise printing, and formation method of highly precise pattern using the same
JP2009212433A Dipping solution used for manufacturing siliceous film and method for manufacturing siliceous film using the same
JP2009206440A Siliceous film forming method and siliceous film formed thereby
JP2009157080A Composition for formation of anti-reflective film and pattern formation method using the same
JP2009155391A Heat-resistant resin molding