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RAINTREE SCIENT INSTR CORP

Overview
  • Total Patents
    16
  • GoodIP Patent Rank
    209,888
About

RAINTREE SCIENT INSTR CORP has a total of 16 patent applications. Its first patent ever was published in 2007. It filed its patents most often in China. Its main competitors in its focus markets computer technology, semiconductors and measurement are SEMICONDUCTOR TECH & INSTR PTE LTD, KLA-TENCOR TECH CORP and HARADA MINORU.

Patent filings in countries

World map showing RAINTREE SCIENT INSTR CORPs patent filings in countries
# Country Total Patents
#1 China 16

Patent filings per year

Chart showing RAINTREE SCIENT INSTR CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Liu Zhijun 6
#2 Shi Yaoming 6
#3 Xu Yiping 6
#4 Zhang Zhensheng 5
#5 Liu Guoxiang 4
#6 Zhou Wanquan 2
#7 Chen Baolong 2
#8 Li Maosen 2
#9 Li Jiazheng 2
#10 Gao Haijun 2

Latest patents

Publication Filing date Title
CN104950421A Automatic focusing system
CN104952759A Control device and control method for microenvironment in wafer cleaning box
CN104941957A Wafer cleaning device and method
CN104750748A Method and device of improving theoretical spectral database creation speed
CN104713917A Method for obtaining space spectrum of sample medium, and apparatus thereof
CN104713487A Adjustable light source device and precise measurement equipment comprising same
CN103869830A Control method for controlling ellipsometer by using real-time system and real-time system
CN103456590A Alignment device with multiple stages of mechanical alignment mechanisms in scanning electron microscope and method thereof
CN103456589A Diaphragm for adjusting particle beam with multipole lenses and device including same
CN103390094A Method for calculating distribution of scattering electromagnetic field incident from light source to medium
CN103185548A Auxiliary device and method for measuring platform performance parameters of semiconductor machine
CN102385569A Method for calculating periodic medium Fourier coefficient
CN102141377A Method for self-defining outline by user in optical critical dimension detection device
CN102183212A Method and device for rapidly determining topography parameters of microperiodic structure
CN101996398A Image matching method and equipment for wafer alignment