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SILICON VALLEY GROUP THERMAL

Overview
  • Total Patents
    92
About

SILICON VALLEY GROUP THERMAL has a total of 92 patent applications. Its first patent ever was published in 1995. It filed its patents most often in Taiwan, Canada and EPO (European Patent Office). Its main competitors in its focus markets surface technology and coating, semiconductors and machines are IPS LTD, SAKAI MASANORI and ISAC RES INC.

Patent filings per year

Chart showing SILICON VALLEY GROUP THERMALs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Bartholomew Lawrence Duane 13
#2 Peabody Christopher A 12
#3 Bailey Robert Jeffrey 11
#4 Dedontney Jay Brian 10
#5 Bartholomew Lawrence D 10
#6 Menagh Frank S 8
#7 Troiani Philip A 7
#8 Yuh Soon K 7
#9 Cossentine Dan L 7
#10 Bailey Robert J 7

Latest patents

Publication Filing date Title
US2002134507A1 Gas delivery metering tube
WO0071778A1 Protective gas shield apparatus
SG87112A1 Gas distribution system
TW452635B Gas delivery metering tube and gas delivery metering device using the same
US6465044B1 Chemical vapor deposition of silicon oxide films using alkylsiloxane oligomers with ozone
CN1351762A Improved trench isolation process to deposit a trench fill oxide prior to sidewall liner oxidation growth
TWI242054B Wafer processing reactor having a gas flow control system and method
US6143080A Wafer processing reactor having a gas flow control system and method
US6352592B1 Free floating shield and semiconductor processing system
US6206973B1 Chemical vapor deposition system and method
WO0003060A1 Chemical vapor deposition apparatus employing linear injectors for delivering gaseous chemicals and method
IL139128D0 Low k dielectric inorganic organic hydrid films and methods of making
CA2261394A1 Double wall reaction chamber glassware
US6056824A Free floating shield and semiconductor processing system
US6200389B1 Single body injector and deposition chamber
TW466596B Method of reducing metal contamination during semiconductor processing in a reactor having metal components
US6026589A Wafer carrier and semiconductor apparatus for processing a semiconductor substrate
TW359943B Single body injector and method for delivering gases to a surface