IPS LTD has a total of 131 patent applications. Its first patent ever was published in 1999. It filed its patents most often in Taiwan, WIPO (World Intellectual Property Organization) and United States. Its main competitors in its focus markets surface technology and coating, semiconductors and machines are SILICON VALLEY GROUP THERMAL, NCD CO and SAKAI MASANORI.
# | Country | Total Patents | |
---|---|---|---|
#1 | Taiwan | 34 | |
#2 | WIPO (World Intellectual Property Organization) | 32 | |
#3 | United States | 18 | |
#4 | Japan | 16 | |
#5 | China | 13 | |
#6 | EPO (European Patent Office) | 9 | |
#7 | Australia | 4 | |
#8 | Singapore | 4 | |
#9 | Germany | 1 |
# | Industry | |
---|---|---|
#1 | Surface technology and coating | |
#2 | Semiconductors | |
#3 | Machines | |
#4 | Electrical machinery and energy | |
#5 | Environmental technology |
# | Name | Total Patents |
---|---|---|
#1 | Park Young-Hoon | 42 |
#2 | Lim Hong-Joo | 21 |
#3 | Kyung Hyun-Soo | 17 |
#4 | Seo Tae Wook | 16 |
#5 | Lee Sang-Kyu | 15 |
#6 | Park Young Hoon | 15 |
#7 | Seo Tae-Wook | 14 |
#8 | Chang Ho-Seung | 14 |
#9 | Bae Jang-Ho | 13 |
#10 | Lim Hong Joo | 10 |
Publication | Filing date | Title |
---|---|---|
US2011083735A1 | Solar cell and method of fabricating the same | |
CN102222598A | Substrate processing device | |
WO2009017322A1 | Reactor for depositing thin film on wafer | |
US2011114114A1 | Cleaning method of apparatus for depositing carbon containing film | |
TW200746333A | Vacuum processing apparatus | |
WO2006098565A1 | Method of depositing thin film using ald process | |
TW200707508A | Chamber for vacuum processing apparatus and apparatus having the same | |
TW200630683A | Vacuum processing apparatus | |
WO2004049413A1 | Apparatus for depositing thin film on wafer | |
TW423054B | Apparatus for depositing thin films on semiconductor wafer by continuous gas injection |