PEAK SYSTEMS INC has a total of 17 patent applications. Its first patent ever was published in 1986. It filed its patents most often in United States, Germany and EPO (European Patent Office). Its main competitors in its focus markets semiconductors, thermal processes and measurement are STEAG RTP SYSTEMS INC, GMEMS CO LTD and STEAG RTP SYSTEMS GMBH.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 8 | |
#2 | Germany | 2 | |
#3 | EPO (European Patent Office) | 2 | |
#4 | Italy | 2 | |
#5 | Netherlands | 2 | |
#6 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Thermal processes | |
#3 | Measurement | |
#4 | Environmental technology | |
#5 | Machines | |
#6 | Electrical machinery and energy | |
#7 | Machine tools |
# | Name | Total Patents |
---|---|---|
#1 | Stultz Timothy J | 7 |
#2 | Kermani Ahmad | 2 |
#3 | Rickords Gary R | 2 |
#4 | Lassig Stephan E | 2 |
#5 | Snow Kenneth A | 2 |
#6 | Johnson Noel H | 2 |
#7 | Eddy William A | 2 |
#8 | Crowley John L | 2 |
#9 | Wolze David A | 2 |
Publication | Filing date | Title |
---|---|---|
US5221142A | Method and apparatus for temperature measurement using thermal expansion | |
US4984902A | Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing | |
US5073698A | Method for selectively heating a film on a substrate | |
US5047611A | Method for selectively curing a film on a substrate | |
US4969748A | Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing | |
US4820906A | Long arc lamp for semiconductor heating | |
US4727297A | Arc lamp power supply | |
US4808059A | Apparatus and method for transferring workpieces |