| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 30 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Optics | |
| #3 | Electrical machinery and energy | |
| #4 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Ohnuma Hideto | 30 |
| #2 | Yamazaki Shunpei | 7 |
| #3 | Iikubo Yoichi | 3 |
| #4 | Kakehata Tetsuya | 3 |
| #5 | Isobe Atsuo | 2 |
| #6 | Godo Hiromichi | 2 |
| #7 | Sakakura Masayuki | 2 |
| #8 | Sasagawa Shinya | 1 |
| #9 | Miyairi Noriko | 1 |
| #10 | Hanaoka Kazuya | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US2012129318A1 | Atmospheric pressure plasma etching apparatus and method for manufacturing soi substrate | |
| US2009203191A1 | Method for manufacturing SOI substrate | |
| US2009098739A1 | Method for manufacturing SOI substrate | |
| US2009098709A1 | Method of manufacturing semiconductor device | |
| US2007206253A1 | Exposure method and method of manufacturing semiconductor device |