| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Republic of Korea | 8 | |
| #2 | United States | 7 | |
| #3 | EPO (European Patent Office) | 4 | |
| #4 | China | 2 | |
| #5 | Singapore | 1 | |
| #6 | Taiwan | 1 | |
| #7 | WIPO (World Intellectual Property Organization) | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Macromolecular chemistry and polymers | |
| #3 | Semiconductors | |
| #4 | Basic materials chemistry | |
| #5 | Organic fine chemistry |
| # | Name | Total Patents |
|---|---|---|
| #1 | Wu Hengpeng | 6 |
| #2 | Yin Jian | 5 |
| #3 | Padmanaban Munirathna | 4 |
| #4 | Rahman M Dalil | 4 |
| #5 | Suzuki Masato | 4 |
| #6 | Toukhy Medhat A | 4 |
| #7 | Liu Weihong | 4 |
| #8 | Yao Huirong | 4 |
| #9 | Baskaran Durairaj | 3 |
| #10 | Kim Jihoon | 3 |
| Publication | Filing date | Title |
|---|---|---|
| CN110100206A | Rotary coating material compositions comprising metal oxide nanoparticles and organic polymer | |
| KR20190087555A | Lithographic composition, method of forming resist pattern and method of manufacturing semiconductor device | |
| KR20190062558A | Chemically amplified positive photoresist composition and pattern forming method using the same | |
| US2020183278A1 | Enviromentally stable, thick film, chemically amplified resist |