| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 15 | |
| #2 | EPO (European Patent Office) | 5 | |
| #3 | Taiwan | 3 | |
| #4 | WIPO (World Intellectual Property Organization) | 3 | |
| #5 | China | 2 | |
| #6 | Republic of Korea | 2 | |
| #7 | Japan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Measurement | |
| #2 | Semiconductors | |
| #3 | Electrical machinery and energy | |
| #4 | Surface technology and coating | |
| #5 | Machine tools | |
| #6 | Engines, pumps and turbines | |
| #7 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Lee Wei Ti | 14 |
| #2 | Pois Heath A | 11 |
| #3 | Klare Mark | 10 |
| #4 | Schueler Bruno W | 10 |
| #5 | Reed David A | 10 |
| #6 | Smedt Rodney | 9 |
| #7 | Larson Charles Thomas | 7 |
| #8 | Kwan Michael C | 6 |
| #9 | Newcome Bruce H | 6 |
| #10 | Bot Lawrence V | 6 |
| Publication | Filing date | Title |
|---|---|---|
| WO2021079307A1 | Patterned x-ray emitting target | |
| WO2020190643A1 | Method and system for monitoring deposition process | |
| US2019277783A1 | XPS metrology for process control in selective deposition | |
| US2020066502A1 | Mass spectrometer detector and system and method using the same |