JORDAN VALLEY SEMICONDUCTORS LTD has a total of 14 patent applications. Its first patent ever was published in 2010. It filed its patents most often in United States, Taiwan and Japan. Its main competitors in its focus markets measurement, electrical machinery and energy and semiconductors are KAPUSTIN VLADIMIR IVANOVICH, FRITZ TOEDT DR ING and MALVERN PANALYTICAL BV.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 7 | |
#2 | Taiwan | 6 | |
#3 | Japan | 1 |
# | Industry | |
---|---|---|
#1 | Measurement | |
#2 | Electrical machinery and energy | |
#3 | Semiconductors | |
#4 | Engines, pumps and turbines | |
#5 | Medical technology |
# | Technology | |
---|---|---|
#1 | Analysing materials | |
#2 | Semiconductor devices | |
#3 | X-ray microscopes | |
#4 | Measuring length, angles and areas | |
#5 | Electric discharge tubes | |
#6 | X-ray technique |
# | Name | Total Patents |
---|---|---|
#1 | Mazor Isaac | 9 |
#2 | Wormington Matthew | 7 |
#3 | Dikopoltsev Alex | 5 |
#4 | Wall John Leonard | 4 |
#5 | Tokar Alex | 4 |
#6 | Peled Asher | 3 |
#7 | Ryan Paul Anthony | 3 |
#8 | Krokhmal Alex | 2 |
#9 | Atrash Fouad | 2 |
#10 | Ostrovsky Olga | 2 |
Publication | Filing date | Title |
---|---|---|
US2016123909A1 | Measurement of small features using XRF | |
US9748070B1 | X-ray tube anode | |
US2015369761A1 | Using multiple sources/detectors for high-throughput X-ray topography measurement | |
US2015369759A1 | X-ray scatterometry apparatus | |
US2015330921A1 | Method for accurately determining the thickness and/or elemental composition of small features on thin-substrates using micro-XRF | |
US2015243469A1 | X-ray source assembly | |
US2015204806A1 | Angle calibration for grazing-incidence X-ray fluorescence (GIXRF) |