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NAWOTEC GMBH

Overview
  • Total Patents
    50
About

NAWOTEC GMBH has a total of 50 patent applications. Its first patent ever was published in 1994. It filed its patents most often in Germany, WIPO (World Intellectual Property Organization) and United States. Its main competitors in its focus markets electrical machinery and energy, semiconductors and optics are AXCELIS TECH INC, CHEMITORONICS CO LTD and J C INOTEC.

Patent filings per year

Chart showing NAWOTEC GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Edinger Klaus 18
#2 Koops Hans W P 14
#3 Hofmann Thorsten 12
#4 Koops Hans Wilfried Peter 9
#5 Spies Petra 8
#6 Becker Rainer 7
#7 Auth Nicole 7
#8 Kaya Alexander 5
#9 Klaus Edinger 4
#10 Koops Hans Wilfried Peter Dr 3

Latest patents

Publication Filing date Title
DE102008062928A1 A method of determining a repair shape of a defect at or near an edge of a substrate of a photomask
TW200941583A Methods and systems for removing a material from a sample
DE102008037943A1 Method and apparatus for electron-beam-induced etching and semiconductor device etched with a structure by means of such a method
DE102008037951A1 Method and apparatus for electron beam induced etching of gallium contaminated layers
US2005230621A1 Apparatus and method for investigating or modifying a surface with a beam of charged particles
US2005103272A1 Material processing system and method
DE10338019A1 Method for high-resolution processing of thin layers with electron beams
DE10302794A1 Manufacture of corpuscular radiation systems, e.g. electron beam or ion beam systems, producing corpuscular radiation systems on substrates using corpuscular radiation induced deposition
DE10241549A1 Orbitron pump
EP1363164A1 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
EP1186079A2 Miniaturized terahertz radiation source
DE10014816A1 Method for determining the refractive index
DE19935558A1 Method for producing structures in a substrate in the nanometer range
DE19720925A1 Device for entering information by means of an object approaching the device
DE4435043A1 Method of making a miniature electrostatic lens
DE4418930A1 Process for producing patterns on substrates by means of corpuscular beam lithography
DE4416597A1 Method and device for producing the pixel radiation sources for flat color screens