| # | Country | Total Patents | |
|---|---|---|---|
| #1 | WIPO (World Intellectual Property Organization) | 4 | |
| #2 | United States | 3 | |
| #3 | EPO (European Patent Office) | 2 | |
| #4 | Taiwan | 2 | |
| #5 | China | 1 | |
| #6 | Hong Kong | 1 | |
| #7 | Israel | 1 | |
| #8 | Republic of Korea | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Measurement | |
| #3 | Medical technology | |
| #4 | Chemical engineering | |
| #5 | Engines, pumps and turbines |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Analysing materials | |
| #3 | Optical systems | |
| #4 | Plasma technique | |
| #5 | Diagnosis and surgery | |
| #6 | X-ray microscopes |
| # | Name | Total Patents |
|---|---|---|
| #1 | Choi Peter | 13 |
| #2 | Aliaga Rossel Raul Fernando | 1 |
| #3 | Peter Choi | 1 |
| #4 | Aliaga Rosser Raul Fernando | 1 |
| Publication | Filing date | Title |
|---|---|---|
| WO2012114147A1 | Method for detecting defects in a microscopic scale on a surface of a sample, and device implementing this method | |
| WO2012101472A1 | Process for manufacturing a plasma source, and plasma source obtained from this manufacturing process | |
| WO2011077195A1 | Plasma source having improved life-time | |
| WO2009104059A1 | Multiplexing of pulsed sources |