| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 7 | |
| #2 | WIPO (World Intellectual Property Organization) | 6 |
| # | Industry | |
|---|---|---|
| #1 | Optics |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Optical systems |
| # | Name | Total Patents |
|---|---|---|
| #1 | Deguenther Markus | 13 |
| #2 | Maul Manfred | 3 |
| #3 | Fiolka Damian | 3 |
| #4 | Layh Michael | 3 |
| #5 | Wangler Johannes | 2 |
| #6 | Gruner Toralf | 2 |
| #7 | Patra Michael | 2 |
| #8 | Major Andras G | 2 |
| #9 | Ziegler Gerhard-Wilhelm | 1 |
| #10 | Andresen Anne Christine | 1 |
| Publication | Filing date | Title |
|---|---|---|
| WO2008061681A2 | Illumination lens system for projection microlithography, and measuring and monitoring method for such an illumination lens system | |
| WO2005040927A2 | Device and method for illumination dose adjustments in microlithography | |
| WO2005015310A2 | Illumination system for a microlithographic projection exposure apparatus |