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MICROMATERIALS LLC

Overview
  • Total Patents
    96
  • GoodIP Patent Rank
    15,017
  • Filing trend
    ⇧ 2033.0%
About

MICROMATERIALS LLC has a total of 96 patent applications. It increased the IP activity by 2033.0%. Its first patent ever was published in 2017. It filed its patents most often in United States, Taiwan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, electrical machinery and energy and surface technology and coating are SWEGAN AB, SUZHOU NANOJOIN PHOTONICS CO LTD and SAN AN OPTOELECTRONICS CO LTD.

Patent filings per year

Chart showing MICROMATERIALS LLCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Mitra Uday 44
#2 Freed Regina 41
#3 Zhang Ying 28
#4 Mullick Amrita B 20
#5 Nemani Srinivas D 20
#6 Liang Qiwei 18
#7 Ingle Nitin K 16
#8 Khan Adib 16
#9 Mallick Abhijit Basu 15
#10 Hwang Ho-Yung David 15

Latest patents

Publication Filing date Title
US2021090952A1 Fully Self-Aligned Via
US2021062318A1 Apparatus and methods for depositing molten metal onto a foil substrate
US2020312953A1 DRAM Capacitor Module
US2019378756A1 Method for creating a fully self-aligned via
US2019348322A1 Selective removal process to create high aspect ratio fully self-aligned via
TW202011547A A method for creating a fully self-aligned via
TW202011523A Method for increasing the verticality of pillars
TW201939628A Methods for removing metal oxides
US2019259625A1 Method for depositing and reflow of a high quality etch resistant gapfill dielectric film
EP3499557A1 Selectively etched self-aligned via processes
CN110034017A Method for making metal and barrier layer-liner controllably be recessed
EP3707746A1 Gas delivery system for high pressure processing chamber
TW201921498A Use of selective aluminum oxide etch
US2019067102A1 Methods of producing self-aligned vias
US2019074219A1 Methods of producing self-aligned vias
WO2019046402A1 Methods of producing self-aligned grown via
KR20200051600A Improved metal contact landing structure
TW201917775A Mask scheme for cut pattern flow with enlarged EPE window
TW201906035A Method of producing fully self-aligned vias and contacts
TW201903834A Self-aligned contact and gate process flow