CHOI BYUNG-JIN has a total of 13 patent applications. Its first patent ever was published in 2007. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, micro-structure and nano-technology and machines are OBDUCAT AB, YONEDA IKUO and MOLECULAR IMPRINTS INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 12 | |
#2 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Micro-structure and nano-technology | |
#3 | Machines | |
#4 | Semiconductors | |
#5 | Audio-visual technology | |
#6 | Surface technology and coating | |
#7 | Environmental technology |
# | Name | Total Patents |
---|---|---|
#1 | Choi Byung-Jin | 13 |
#2 | Sreenivasan Sidlgata V | 7 |
#3 | Ganapathisubramanian Mahadevan | 3 |
#4 | Nimmakayala Pawan Kumar | 2 |
#5 | Resnick Doublas J | 1 |
#6 | Miller Michael N | 1 |
#7 | Colburn Mattherw E | 1 |
#8 | Willson Carlton Grant | 1 |
#9 | Schumaker Philip D | 1 |
#10 | Song Hong-Sung | 1 |
Publication | Filing date | Title |
---|---|---|
US2013214452A1 | Large area imprint lithography | |
US2011183070A1 | Roll-to-roll imprint lithography and purging system | |
US2010109202A1 | Substrate alignment | |
US2010110434A1 | Alignment for edge field nano-imprinting | |
US2010110409A1 | Separation in an imprint lithography process |