MEMSSTAR LTD has a total of 22 patent applications. It increased the IP activity by 0.0%. Its first patent ever was published in 2005. It filed its patents most often in EPO (European Patent Office), United Kingdom and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets micro-structure and nano-technology, semiconductors and surface technology and coating are XU JINGHUI, DALSA SEMICONDUCTOR INC and ANHUI BEIFANG XINDONG LIANKE MICROSYSTEM TECH CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | EPO (European Patent Office) | 6 | |
#2 | United Kingdom | 6 | |
#3 | WIPO (World Intellectual Property Organization) | 4 | |
#4 | China | 3 | |
#5 | Republic of Korea | 2 | |
#6 | United States | 1 |
# | Name | Total Patents |
---|---|---|
#1 | O'Hara Anthony | 18 |
#2 | Pringle Graeme | 2 |
#3 | Anthony O'Hara | 2 |
#4 | Leavy Michael | 2 |
#5 | Drysdale Daniel | 1 |
#6 | Mckie Anthony | 1 |
#7 | Daniel Drysdale | 1 |
Publication | Filing date | Title |
---|---|---|
GB201916586D0 | Method of manufacturing a microstructure | |
GB201814619D0 | A method for detecting defects in thin film layers | |
US2018029883A1 | Selectivity in a xenon difluoride etch process | |
GB201409992D0 | Improved process monitoring methods and apparatus | |
GB201115105D0 | Improved deposition technique for micro electro-mechanical structures (MEMS) | |
GB201101188D0 | Vapour Etch of Silicon Dioxide with Improved Selectivity | |
GB0916871D0 | Improved selectivity in a xenon difluoride etch process | |
EP2046677A1 | Method of etching a sacrificial silicon oxide layer | |
EP1842222A1 | Method and apparatus for monitoring a microstructure etching process | |
EP1766665A2 | Improved method for the etching of microstructures |