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KCTECH CO LTD

Overview
  • Total Patents
    595
  • GoodIP Patent Rank
    2,590
  • Filing trend
    ⇩ 7.0%
About

KCTECH CO LTD has a total of 595 patent applications. It decreased the IP activity by 7.0%. Its first patent ever was published in 1998. It filed its patents most often in Republic of Korea, China and Taiwan. Its main competitors in its focus markets semiconductors, basic materials chemistry and machine tools are JIANGSU SUE AND OPTICAL EQUIPMENT CO LTD, ORIOL INC and CETC BEIJING ELECTRONIC EQUIPMENT CO LTD.

Patent filings per year

Chart showing KCTECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lee Keun Woo 55
#2 Park Sung Hyeon 39
#3 Hwang Jun Ha 37
#4 Cho Moon Gi 35
#5 Kim Jung Yoon 28
#6 Park Kwang Soo 28
#7 Lim Jong Il 27
#8 Shin In Chul 22
#9 Yang Hae Won 20
#10 Cho Kang Il 19

Latest patents

Publication Filing date Title
KR20210008430A Polishing slurry composition for sti process
KR20210003702A Polishing slurry composition and method for preparing the same
KR20200141420A Polishing slurry composition
KR20200085689A Cerium based polishing particle and the manufacturing method thereof
KR20200050917A Polishing slurry composition for sti process
KR20200038437A Slurry composition for cmp and the polishing particle therein
TW202022091A Etching solution with high selectivity for semiconductor, etching solution with selectivity to silicon nitride layer, and method for manufacturing a semiconductor device using the same
WO2020138737A1 One-component polishing slurry composition and polishing method using same
KR20200064000A Retainer ring in carrier head for chemical mechanical polishing apparatus and carrier head having the same
WO2020122454A1 Highly selective etchant for semiconductor, selective etchant for silicon nitride film, and manufacture of semiconductor device using same
KR102220155B1 Composite particles for optically clear adhesive and optically clear adhesive composition comprising the same
KR20210032171A Substrate cleaning apparatus
KR20210030144A Chamber cleaning device
KR20200083175A One-component type slurry composition and method of chemical mechanical polishing using same
KR20210025989A Method for preparing surface-treated titania particle, surface-treated titania particle theby, titania particle-dispersion composition and composition for coating
KR20210021778A Chamber monitoring device and chamber monitoring method
KR20210015056A Apparatus for Treating Substrate
KR20210014927A Etching solution with selectivity to silicon nitride layer and method for manufacturing a semiconductor device using the same
KR20210015055A Apparatus for Treating Substrate
KR20210008995A Retainer ring of carrier head for substrate polishing apparatus