JEONG IN KWON has a total of 14 patent applications. Its first patent ever was published in 1998. It filed its patents most often in Republic of Korea, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, machine tools and chemical engineering are SHANGHAI ADVANCED SILICON TECHNOLOGY CO LTD, MICRO ENGINEERING INC and SETEK M KK.
# | Country | Total Patents | |
---|---|---|---|
#1 | Republic of Korea | 5 | |
#2 | United States | 4 | |
#3 | WIPO (World Intellectual Property Organization) | 4 | |
#4 | China | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Machine tools | |
#3 | Chemical engineering | |
#4 | Pharmaceuticals |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Grinding or polishing devices | |
#3 | Cleaning | |
#4 | Medical preparations |
# | Name | Total Patents |
---|---|---|
#1 | Jeong In Kwon | 13 |
#2 | Kim Jungyup | 2 |
#3 | Kim Yong Bae | 2 |
#4 | Kim Seon Ae | 1 |
#5 | Kwon Yeong | 1 |
#6 | Kim Jeong Han | 1 |
Publication | Filing date | Title |
---|---|---|
KR20180006224A | Atomic layer deposition apparatus and methods | |
WO2012108712A2 | Semiconductor wafer cleaning apparatus | |
KR20120092074A | Semiconductor wafer cleaning appratus | |
KR20120099702A | Apparatus and method for polishing and washing a semiconductor wafer | |
US2006281393A1 | Chemical mechanical polishing tool, apparatus and method | |
CN1741875A | Apparatus and method for polishing semiconductor wafers | |
US7022193B2 | Apparatus and method for treating surfaces of semiconductor wafers using ozone | |
KR20000031977A | Method to suppress tumor cell proliferation using berberrubine |