JOINT INDUSTRIAL PROCESSORS FOR ELECTRONICS has a total of 35 patent applications. Its first patent ever was published in 1999. It filed its patents most often in France, WIPO (World Intellectual Property Organization) and Australia. Its main competitors in its focus markets semiconductors, surface technology and coating and chemical engineering are INTEGRATED PROCESS SYSTEMS, CREAPHYS GMBH and SILICON VALLEY GROUP THERMAL.
# | Country | Total Patents | |
---|---|---|---|
#1 | France | 9 | |
#2 | WIPO (World Intellectual Property Organization) | 7 | |
#3 | Australia | 5 | |
#4 | United States | 4 | |
#5 | EPO (European Patent Office) | 3 | |
#6 | China | 2 | |
#7 | Japan | 2 | |
#8 | Republic of Korea | 2 | |
#9 | Canada | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Surface technology and coating | |
#3 | Chemical engineering | |
#4 | Machines | |
#5 | Electrical machinery and energy |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Coating metallic material | |
#3 | Separation | |
#4 | Unspecified technologies | |
#5 | Electric discharge tubes |
# | Name | Total Patents |
---|---|---|
#1 | Guillon Herve | 24 |
#2 | Laporte Franck | 22 |
#3 | Pierret Benoit | 16 |
#4 | Ducret Rene-Pierre | 14 |
#5 | Ducret Rene Pierre | 12 |
#6 | Semmache Bachir | 10 |
#7 | Touchais Papet Emmanuelle | 4 |
#8 | Brutti Thierry | 4 |
#9 | Jimenez Nicollin Carmen | 3 |
#10 | Decams Jean-Emmanuel | 3 |
Publication | Filing date | Title |
---|---|---|
FR2843629A1 | Fast thermal processing device having inside the reaction chamber of cold-walled halogen infrared lamps | |
AU2002233412A1 | Anti-corrosive metal reaction chamber for chemical vapour deposition or rapid thermal annealing process | |
FR2829037A1 | Multi-speaker device for fractional evaporation and separation of a solution | |
FR2818292A1 | Anti-corrosion metal reaction chamber cvd or rtp | |
FR2816520A1 | Multi-zone injection device in an rtp or cvd reactor with electromagnetic radiation lamp heating | |
FR2816519A1 | Gas injection device in an electromagnetic radiation lamp heating reactor, and treatment oven provided with such a device | |
FR2815395A1 | Device for quick and uniform heating of a substrate by infrared radiation | |
FR2800754A1 | Device for evaporating a chemical vapor deposit system | |
FR2792774A1 | Method and device for treating a material by electromagnetic radiation and in a controlled atmosphere | |
FR2792084A1 | Integrated heating and cooling device in a heat treatment reactor of a substrate |