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DE102019129788A1
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Use of a CVD reactor to deposit two-dimensional layers
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DE102019129789A1
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Process for depositing a two-dimensional layer and CVD reactor
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DE102019127375A1
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Gas outlet element of a CVD reactor
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DE102019126769A1
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Process chamber with self-closing gas outlet
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DE102019123556A1
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Loading module for a CVD reactor system
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DE102019120589A1
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Gas distributor for a CVD reactor
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DE102019119019A1
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Gas inlet element for a CVD reactor
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DE102019117543A1
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Method for calibrating / verifying mass flow measuring / control devices of a gas mixing system and device for carrying out the method
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DE102019117479A1
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Flat component that can be used in a CVD reactor
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DE102019116460A1
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Device and method for determining and setting the inclination position of a susceptor
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DE102019116387A1
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Vacuum flange connection
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DE102019115919A1
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Electrode for a lithium-ion accumulator and method for its production
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DE102019114249A1
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Arrangement for measuring the surface temperature of a susceptor in a CVD reactor
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DE102019111598A1
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Process for depositing a semiconductor layer system containing gallium and indium
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WO2019211280A2
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Device for coating a substrate with a carbon-containing coating
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DE102019109987A1
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Method for conditioning a substrate treatment device and a device relating thereto
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DE102019107857A1
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Heating device for a susceptor of a CVD reactor
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DE102019107295A1
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Method for determining the state of a CVD reactor under production conditions
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DE102019105913A1
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Susceptor arrangement of a CVD reactor
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DE102019104433A1
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CVD reactor with means for locally influencing the susceptor temperature
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