JOHNSON WAYNE L has a total of 17 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 1991. It filed its patents most often in WIPO (World Intellectual Property Organization), United States and EPO (European Patent Office). Its main competitors in its focus markets electrical machinery and energy, chemical engineering and surface technology and coating are MANTIS DEPOSITION LTD, HQ DIELECTRICS GMBH and ADVANCED MICRO FAB EQUIP INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | WIPO (World Intellectual Property Organization) | 14 | |
#2 | United States | 2 | |
#3 | EPO (European Patent Office) | 1 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Chemical engineering | |
#3 | Surface technology and coating | |
#4 | Semiconductors | |
#5 | Materials and metallurgy | |
#6 | Environmental technology | |
#7 | Machines |
# | Name | Total Patents |
---|---|---|
#1 | Johnson Wayne L | 17 |
#2 | Windhorn Thomas H | 2 |
#3 | Murr Lawrence | 2 |
#4 | Franz Patrick | 2 |
#5 | Halpin Mike | 2 |
#6 | Strang Eric J | 2 |
#7 | Parsons Richard | 1 |
#8 | Verdeyen Joseph T | 1 |
#9 | Mitrovic Andrej S | 1 |
#10 | Fink Steven T | 1 |
Publication | Filing date | Title |
---|---|---|
EP3429846A1 | Systems and methods for depositing charged metal droplets onto a workpiece | |
US2012270304A1 | Photo-bioreactor system and method | |
WO02075801A2 | Method of fabricating oxides with low defect densities | |
WO0237521A2 | Hall effect ion source at high current density | |
WO0165590A2 | Esrf source for ion plating epitaxial deposition | |
WO0165895A2 | Electrically controlled plasma uniformity in a high density plasma source | |
WO0106544A2 | Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma | |
WO9919526A2 | Apparatus and method for adjusting density distribution of a plasma | |
WO9919527A2 | Apparatus and method for utilizing a plasma density gradient to produce a flow of particles | |
US5234529A | Plasma generating apparatus employing capacitive shielding and process for using such apparatus |