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MICRO ENGINEERING INC

Overview
  • Total Patents
    30
  • GoodIP Patent Rank
    196,375
About

MICRO ENGINEERING INC has a total of 30 patent applications. Its first patent ever was published in 1990. It filed its patents most often in Japan, United States and Taiwan. Its main competitors in its focus markets semiconductors, machine tools and optics are JEONG IN KWON, SHANGHAI ADVANCED SILICON TECHNOLOGY CO LTD and KANG JOON MO.

Patent filings in countries

World map showing MICRO ENGINEERING INCs patent filings in countries

Patent filings per year

Chart showing MICRO ENGINEERING INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Komura Akio 15
#2 Komata Yoichi 8
#3 Matsuzawa Minoru 6
#4 Tomizawa Hajime 2
#5 Mesa Bernard E 1
#6 Fukuda Naomichi 1
#7 Kuwano Takashi 1
#8 Matsuda Takeshi 1
#9 Usui Hiroaki 1
#10 Hosoya Hiroshi 1

Latest patents

Publication Filing date Title
US2020249588A1 Adhesive residue removal apparatus and adhesive residue removal method
JP2016020017A Grinding unit and grinding processing equipment
JP2015223681A Polishing head and polishing device
JP2015080771A Ring with hole and nano-bubble generating device with same mounted thereon
JP2015058958A Packaging device and packaging system
JP2015039742A Polishing head and polishing apparatus
JP2014065961A Functional membrane, membrane deposition apparatus, and membrane deposition method
JP2014018933A Polishing head and polishing device
JP2013093407A Substrate processing apparatus and substrate processing method
JP2013063416A Cup shaped mist recovery device
JP2012134390A Substrate processing apparatus and substrate processing method
JP2012089661A Substrate processing device and substrate processing method
JP2009262033A Beam deflection control method
JP2009044045A Thin film forming apparatus
JP2008277596A Surface scratch defect inspection apparatus
JP2008119560A Steam focusing nozzle and cleaning process
JP2007333556A Method and device for multiple point measurement of perpendicularity
JP2007253091A Cleaning of fine pattern surface
JP2007216158A Substrate cleaning method and apparatus using superheated steam
JP2007180117A Method of cleaning substrate and apparatus therefor