| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Taiwan | 4 | |
| #2 | Japan | 3 | |
| #3 | WIPO (World Intellectual Property Organization) | 3 | |
| #4 | EPO (European Patent Office) | 1 | |
| #5 | Republic of Korea | 1 | |
| #6 | United States | 1 |
| # | Industry | |
|---|---|---|
| #1 | Surface technology and coating | |
| #2 | Semiconductors | |
| #3 | Chemical engineering |
| # | Technology | |
|---|---|---|
| #1 | Coating metallic material | |
| #2 | Plasma technique | |
| #3 | Semiconductor devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Torii Hironori | 6 |
| #2 | Washio Keisuke | 5 |
| #3 | Tanaka Kozue | 3 |
| #4 | Shimada Masaru | 3 |
| #5 | Kageyama Kouji | 2 |
| #6 | Washio Yoshiaki | 1 |
| #7 | Mori Yasunari | 1 |
| #8 | Hattori Nozomu | 1 |
| #9 | Kageyama Koji | 1 |
| Publication | Filing date | Title |
|---|---|---|
| JP2020122178A | Target and film deposition apparatus, and method of manufacturing object of film deposition | |
| JP2020063471A | Plasma film deposition device and plasma film deposition method | |
| JP2015073019A | Atomic layer deposition apparatus and atomic layer deposition method |