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Techniques for providing a semiconductor memory device
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WO2010102106A2
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Techniques for forming a contact to a buried diffusion layer in a semiconductor memory device
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Integrated circuit having memory cells including gate material having high work function, and method of manufacturing the same
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Integrated circuit having memory cell array including barriers, and method of manufacturing same
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Sense amplifier circuitry for integrated circuit having memory cell array, and method of operating same
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Integrated circuit having voltage generation circuitry for memory cell array, and method of operating and/or controlling same
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Floating-body dram transistor comprising source/drain regions separated from the gated body region
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Integrated circuit including memory array having a segmented bit line architecture and method of controlling and/or operating same
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Integrated circuit having memory array including row redundancy, and method of programming, controlling and/or operating same
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Semiconductor memory array architecture with grouped memory cells, and method of controlling same
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Memory array having a programmable word length, and method of operating same
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Multi-bit memory cell having electrically floating body transistor, and method of programming and reading same
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Method and apparatus for variable memory cell refresh
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Electrically floating body memory cell and array, and method of operating or controlling same
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Memory cell and memory cell array having an electrically floating body transistor, and methods of operating same
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Memory cell having an electrically floating body transistor and programming technique therefor
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