HOYA SCHOTT KK has a total of 11 patent applications. Its first patent ever was published in 1999. It filed its patents most often in Japan and Taiwan. Its main competitors in its focus markets electrical machinery and energy, measurement and semiconductors are KRASSNITZER SIEGFRIED, NIPPON ELECTRON OPTICS LAB and PERKINELMER OPTOELECTRONICS.
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Measurement | |
#3 | Semiconductors | |
#4 | Surface technology and coating |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Measuring light | |
#3 | Coating metallic material | |
#4 | Semiconductor devices |
# | Name | Total Patents |
---|---|---|
#1 | Amano Satoru | 5 |
#2 | Jinbo Yosuke | 3 |
#3 | Kobayashi Norio | 3 |
#4 | Kogure Yasuo | 2 |
#5 | Hiratsuka Katsumi | 2 |
#6 | Niwa Shunji | 2 |
#7 | Hayashi Hirobumi | 1 |
Publication | Filing date | Title |
---|---|---|
JP2001217216A | Method and device for ultraviolet-ray irradiation | |
JP2001300451A | Ultraviolet irradiation device | |
JP2001255407A | Reflection mirror and optical device using the same | |
JP2001228018A | Light intensity measuring apparatus for excimer lamp | |
JP2001155684A | Dielectric barrier excimer lamp | |
JP2001155686A | Dielectric barrier excimer lamp | |
JP2001113163A | Ultraviolet light irradiation device and method | |
JP2001079387A | Ultraviolet ray irradiation device and method thereof | |
JP2001015472A | Method and device for projecting ultraviolet ray |