|
WO2016069490A1
|
|
Magnetic anode for sputter magnetron cathode
|
|
WO2015171651A1
|
|
Scratch and fingerprint resistant anti-reflective films for use on display windows of electronic devices and other related technology
|
|
WO2015112918A1
|
|
Scratch and fingerprint resistant anti-reflective films for use on display windows of electronic devices and other related technology
|
|
WO2015085283A1
|
|
Durable anti-reflective coated substrates for use in electronic-device displays and other related technology
|
|
WO2015070254A1
|
|
Multiple layer anti-reflective coating
|
|
WO2015061484A1
|
|
Multiple layer anti-reflective coating
|
|
WO2015010036A1
|
|
Method for manufacturing barrier films
|
|
US2016133426A1
|
|
Linear duoplasmatron
|
|
WO2014047367A1
|
|
Uniform force flange clamp
|
|
WO2012109523A2
|
|
Deposition of thin films on energy sensitive surfaces
|
|
WO2011146673A2
|
|
High target utilization moving magnet planar magnetron scanning method
|
|
WO2011056581A2
|
|
Rotary magnetron magnet bar and apparatus containing the same for high target utilization
|
|
KR20120085254A
|
|
Plasma enhanced chemical vapor deposition apparatus
|
|
WO2011017314A2
|
|
Closed drift ion source with symmetric magnetic field
|
|
WO2010115189A1
|
|
Rotary magnetron
|
|
CN102308358A
|
|
Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith
|
|
US2011236591A1
|
|
Bipolar rectifier power supply
|
|
WO2008154397A1
|
|
Rotatable magnetron sputtering with axially moveable target electrode tube
|
|
EP1390964A1
|
|
Dipole ion source
|
