WO2012066080A1
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Sputtering apparatus and method
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WO2012066079A1
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Soft sputtering magnetron system
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US2011100809A1
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Method to manufacture an oxide sputter target comprising a first and second phase
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WO2009138348A1
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A rotatable sputtering magnetron with high stiffness
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TW200949118A
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Multiple grooved vacuum coupling
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TW200914637A
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Insert piece for an end-block of a sputtering installation
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WO2007147757A1
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Insert piece for an end-block of a sputtering installation
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US2009139862A1
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Rotatable sputter target
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WO2007141173A1
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A rotatable sputter target
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WO2007003488A1
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A module for coating both sides of a substrate in a single pass
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CN101137764A
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Single, right-angled end-block
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EP1826292A1
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Sputter module.
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An end-block for a rotatable target sputtering apparatus
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KR20070067139A
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Flat end-block for carrying a rotatable sputtering target
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An elongated gas ditribution system
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Cylindrical target obtained by hot isostatic pressing
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EP1733412A1
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A tubular magnet assembly
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Method to reduce thermal stresses in a sputter target
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Rotating tubular sputter target assembly
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EP1606543A1
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Universal vacuum coupling for cylindrical target
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