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BEKAERT ADVANCED COATINGS

Overview
  • Total Patents
    58
About

BEKAERT ADVANCED COATINGS has a total of 58 patent applications. Its first patent ever was published in 1996. It filed its patents most often in WIPO (World Intellectual Property Organization), EPO (European Patent Office) and China. Its main competitors in its focus markets electrical machinery and energy, surface technology and coating and chemical engineering are CHISTYAKOV ROMAN, CORE TECH INC and ZOND INC.

Patent filings per year

Chart showing BEKAERT ADVANCED COATINGSs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 De Bosscher Wilmert 39
#2 Van De Putte Ivan 14
#3 De Boever Joannes 10
#4 Dellaert Krist 10
#5 Wilmert De Bosscher 8
#6 Goderis Parsifal 8
#7 Delrue Hilde 7
#8 Lapeire Gregory 6
#9 Vermeersch Ruben 5
#10 Van Holsbeke Johnny 4

Latest patents

Publication Filing date Title
WO2012066080A1 Sputtering apparatus and method
WO2012066079A1 Soft sputtering magnetron system
US2011100809A1 Method to manufacture an oxide sputter target comprising a first and second phase
WO2009138348A1 A rotatable sputtering magnetron with high stiffness
TW200949118A Multiple grooved vacuum coupling
TW200914637A Insert piece for an end-block of a sputtering installation
WO2007147757A1 Insert piece for an end-block of a sputtering installation
US2009139862A1 Rotatable sputter target
WO2007141173A1 A rotatable sputter target
WO2007003488A1 A module for coating both sides of a substrate in a single pass
CN101137764A Single, right-angled end-block
EP1826292A1 Sputter module.
WO2006042808A1 An end-block for a rotatable target sputtering apparatus
KR20070067139A Flat end-block for carrying a rotatable sputtering target
CN101040061A An elongated gas ditribution system
CN1985345A Cylindrical target obtained by hot isostatic pressing
EP1733412A1 A tubular magnet assembly
US2007137999A1 Method to reduce thermal stresses in a sputter target
WO2005005682A1 Rotating tubular sputter target assembly
EP1606543A1 Universal vacuum coupling for cylindrical target