FURUKAWA TOSHIHARU has a total of 11 patent applications. Its first patent ever was published in 2004. It filed its patents most often in United States. Its main competitors in its focus markets semiconductors, micro-structure and nano-technology and machines are TEXAS INSTR ACER INC, TU PO-MIN and VISUAL PHOTONICS EPITAXY CO LT.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 11 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Micro-structure and nano-technology | |
#3 | Machines |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Unspecified technologies | |
#3 | Nanostructure applications |
# | Name | Total Patents |
---|---|---|
#1 | Furukawa Toshiharu | 11 |
#2 | Horak David V | 8 |
#3 | Holmes Steven J | 5 |
#4 | Koburger Iii Charles W | 5 |
#5 | Hakey Mark C | 3 |
#6 | Koburger Charles W | 2 |
#7 | Robison Robert R | 1 |
#8 | Koburger Charles W Iii | 1 |
#9 | Slinkman James Albert | 1 |
#10 | Koburger Iii Charles William | 1 |
Publication | Filing date | Title |
---|---|---|
US2012018806A1 | Semiconductor-on-insulator (SOI) structure with selectively placed sub-insulator layer void(s) and method of forming the SOI structure | |
US2008217730A1 | Methods of forming gas dielectric and related structure | |
US2008085600A1 | Method of forming lithographic and sub-lithographic dimensioned structures | |
US2005227498A1 | Method for fabricating strained silicon-on-insulator structures and strained silicon-on insulator structures formed thereby |