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EUGENE TECHNOLOGY MATERIALS

Overview
  • Total Patents
    13
  • GoodIP Patent Rank
    143,375
About

EUGENE TECHNOLOGY MATERIALS has a total of 13 patent applications. Its first patent ever was published in 2013. It filed its patents most often in Republic of Korea and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets organic fine chemistry, surface technology and coating and semiconductors are UP CHEMICAL CO LTD, HEFEI ANDE KEMING SEMICONDUCTOR TECH CO LTD and DNF CO LTD.

Patent filings in countries

World map showing EUGENE TECHNOLOGY MATERIALSs patent filings in countries

Patent filings per year

Chart showing EUGENE TECHNOLOGY MATERIALSs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lee Geun Su 12
#2 Lee Yeong Min 6
#3 Han Joung Min 4
#4 Koh Young Dae 4
#5 Cho Bo Yeon 2
#6 Kim Sang Min 2
#7 Ock Kwang Su 2
#8 Park Seong Jin 1
#9 Cha Byung Kwan 1
#10 Lee Kang Wook 1

Latest patents

Publication Filing date Title
KR20150143371A Precusor compounds and Method for forming a thin film using thereof
KR20160082321A Precursor for depositing aluminum thin film and method for depositing thin film using thereof
KR20150108779A Organo germanium compounds and method of depositing thin film using them as precursors
KR20150097429A Precursor compositions for forming germanium antimony telurium alloy and method of forming germanium antimony telurium alloy layer using them as precursors
KR20160071026A Organo group 14 metalloid azide precursors and method for dipositing thin film using thereof
KR20150059129A Organo group 14 metalloid azide compounds and method of thin film deposition using them as precursors
KR20150145559A Precursor compositions and Method for forming a thin film using thereof
KR20150117179A Novel precursor compounds for forming zirconium-containing film, compositions for forming zirconium-containing film comprising the same, and method of forming zirconium-containing film using them as precursors
KR20150108664A precursor compounds and thin film deposition method using the precusor compoumds
KR20150101318A Precursor compositions for forming zirconium-containing film and method of forming zirconium-containing film using them as precursors
KR20140029136A Cyclic aminosilane compounds having excellent affinity towards silicon and metal atoms, preparing method thereof, and its application