Single source precursors for atomic layer deposition
GB0523429D0
Improved bubbler for the transportation of substances by a carrier gas
GB0523339D0
Hafnocene and zirconocene precursors, and use thereof in atomic layer deposition
GB0512392D0
Precursors for chemical vapour depositions
GB0502446D0
Precursors for chemical vapour deposition comprising metal & ligand with co-ordinating N & O, separated by 2 or 3 carbons, & sterically hindering substituent
GB0412790D0
Precursors for deposition of silicon nitride,silicon oxynitride and metal silicon oxynitrides
GB0406190D0
Precursors for deposition of group IVB metal silicate thin films
GB0325752D0
Precursors for chemical vapour deposition
GB0323388D0
Improved bubbler for the transportation of substances by a carrier gas
GB0321482D0
Improved bubbler for the transportation of substances by a carrier gas
GB0321409D0
Precursors for chemical vapour deposition
GB0320929D0
Improved precursors for the metalorganic chemical vapour deposition of group IVB metal silicate films
GB0318390D0
Vapour phase deposition of silicate and oxide films
US2005247125A1
Method and apparatus for monitoring liquid levels within a vessel
GB0306422D0
Improved precursors for the metalorganic chemical vapour deposition of group IVB metal silicate thin films
GB0306027D0
Precursors for chemical vapour deposition
GB0306028D0
Vapour phase deposition of silicate and oxide films
GB0301886D0
Improved precursors for the metalorganic chemical vapour deposition of group IVB metal oxide thin films
AU2002337310A1
Improved precursors for chemical vapour deposition
GB0218544D0
Deposition of lanthanum silicate and lanthanum oxide films