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EPICHEM LTD

Overview
  • Total Patents
    85
About

EPICHEM LTD has a total of 85 patent applications. Its first patent ever was published in 1992. It filed its patents most often in United Kingdom, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets surface technology and coating, organic fine chemistry and measurement are UP CHEMICAL CO LTD, EUGENE TECHNOLOGY MATERIALS and HEFEI ANDE KEMING SEMICONDUCTOR TECH CO LTD.

Patent filings per year

Chart showing EPICHEM LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Jones Anthony Copeland 26
#2 Williams Graham 25
#3 Odedra Rajesh 22
#4 Ravetz Megan 10
#5 Cunning Hugh 8
#6 Blunt Roy Trevor 8
#7 Nelson Andrew 8
#8 Smith Lindsay 7
#9 Williams Howard 6
#10 Rushworth Simon Andrew 6

Latest patents

Publication Filing date Title
GB0613453D0 Single source precursors for atomic layer deposition
GB0523429D0 Improved bubbler for the transportation of substances by a carrier gas
GB0523339D0 Hafnocene and zirconocene precursors, and use thereof in atomic layer deposition
GB0512392D0 Precursors for chemical vapour depositions
GB0502446D0 Precursors for chemical vapour deposition comprising metal & ligand with co-ordinating N & O, separated by 2 or 3 carbons, & sterically hindering substituent
GB0412790D0 Precursors for deposition of silicon nitride,silicon oxynitride and metal silicon oxynitrides
GB0406190D0 Precursors for deposition of group IVB metal silicate thin films
GB0325752D0 Precursors for chemical vapour deposition
GB0323388D0 Improved bubbler for the transportation of substances by a carrier gas
GB0321482D0 Improved bubbler for the transportation of substances by a carrier gas
GB0321409D0 Precursors for chemical vapour deposition
GB0320929D0 Improved precursors for the metalorganic chemical vapour deposition of group IVB metal silicate films
GB0318390D0 Vapour phase deposition of silicate and oxide films
US2005247125A1 Method and apparatus for monitoring liquid levels within a vessel
GB0306422D0 Improved precursors for the metalorganic chemical vapour deposition of group IVB metal silicate thin films
GB0306027D0 Precursors for chemical vapour deposition
GB0306028D0 Vapour phase deposition of silicate and oxide films
GB0301886D0 Improved precursors for the metalorganic chemical vapour deposition of group IVB metal oxide thin films
AU2002337310A1 Improved precursors for chemical vapour deposition
GB0218544D0 Deposition of lanthanum silicate and lanthanum oxide films