Learn more

DUSSARRAT CHRISTIAN

Overview
  • Total Patents
    35
  • GoodIP Patent Rank
    232,291
About

DUSSARRAT CHRISTIAN has a total of 35 patent applications. Its first patent ever was published in 2004. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets surface technology and coating, semiconductors and organic fine chemistry are HEATHFIELD RICHARD, DNF CO LTD and STEIGER JUERGEN.

Patent filings in countries

World map showing DUSSARRAT CHRISTIANs patent filings in countries

Patent filings per year

Chart showing DUSSARRAT CHRISTIANs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Dussarrat Christian 35
#2 Omarjee Vincent M 14
#3 Lansalot-Matras Clement 11
#4 Gatineau Julien 4
#5 Pallem Venkateswara R 3
#6 Yanagita Kazutaka 3
#7 Pinchart Audrey 2
#8 Lachaud Christophe 2
#9 Tamaoki Naoki 2
#10 Tsukada Eri 2

Latest patents

Publication Filing date Title
WO2013109401A1 Silicon containing compounds for ald deposition of metal silicate films
US2013109198A1 High carbon content molecules for amorphous carbon deposition
US2013089679A1 Plasma-enhanced deposition of manganese-containing films for various applications using amidinate manganese precursors
US2013089681A1 Plasma-enhanced deposition of titanium-containing films for various applications using amidinate titanium precursors
US2013089678A1 Plasma-enhanced deposition of nickel-containing films for various applications using amidinate nickel precursors
US2013089680A1 Plasma-enhanced deposition of ruthenium-containing films for various applications using amidinate ruthenium precursors
US2013084407A1 Plasma-enhanced deposition of copper-containing films for various applications using amidinate copper precursors
US2012207928A1 Methods of making and deposition methods using hafnium- or zirconium-containing compounds
US2010193951A1 Metal precursors for deposition of metal-containing films
US2010256405A1 Synthesis of allyl-containing precursors for the deposition of metal-containing films
US2010034719A1 Novel lanthanide beta-diketonate precursors for lanthanide thin film deposition
US2008286983A1 Deposition of Ta- or Nb-doped high-k films
US2010104755A1 Deposition method of ternary films
US2006198958A1 Methods for producing silicon nitride films by vapor-phase growth