Holding device capable of preventing wafer from releasing from carrying disc and reducing risks of cracks or damages on wafer surface
TWI634613B
Carrier plate including a loading top surface and a liquid retaining ring surface
TWI631644B
Linkage device and processing device having the same
TWI626711B
Clamping mechanism and carrier device having the same capable of leveling wafer for effectively enhancing production yield
TWI569354B
Immersing apparatus which can be simplified in structure to lower the manufacturing cost, reduce the volume for decreasing the occupied space, and simplify the processing flow for greatly reducing the labor hour
TWI584882B
Multi-nozzle device capable of enhancing cleaning speed, efficiency and effect
TW201731600A
Anti splash device of wafer cleaning machine having a mask unit to switch between a folded status and an unfolded status relative to the wafer bearing device
TWI576944B
Wafer carrying device having two different wafer accommodation spaces defined by plural bearing columns
TWI562878B
Centering device and process unit with centering device having first and second clamping members positioning at the center for the first and second wafers with different sizes at the same horizontal height position
TWI560800B
Carrying device capable of carrying and moving a wafer upward and downward for providing more usage flexibility
TWI569879B
Spraying nozzle comprising first and second discharge openings to discharge gas to respectively form first and second gas curtains that shape mist sprayed from a nozzle assembly
TWI555113B
Immersing equipment
TW201642388A
Wafer holding device
TWI520794B
Soaking equipment with rinsing device
TW201616588A
Substrate clamping device
TW201615522A
Wafer receiving device for chemical treatment
TW201614764A
A load bearing device having a holding mechanism and a cockerel mechanism
TW201608668A
Bearing device
TW201544194A
Spin coating device capable of controlling solvent volatilization rate
TW201527905A
Photoresist heating equipment capable of upper roasting
