| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 5 | |
| #2 | Australia | 4 | |
| #3 | WIPO (World Intellectual Property Organization) | 3 | |
| #4 | EPO (European Patent Office) | 2 | |
| #5 | Canada | 1 | |
| #6 | China | 1 | |
| #7 | Japan | 1 | |
| #8 | Taiwan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Chemical engineering | |
| #3 | Machines | |
| #4 | Optics | |
| #5 | Basic materials chemistry |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Cleaning | |
| #3 | Unspecified technologies | |
| #4 | Photomechanical semiconductor production | |
| #5 | Soaps |
| # | Name | Total Patents |
|---|---|---|
| #1 | Matthews Robert Roger | 11 |
| #2 | Matthews Robert R | 6 |
| #3 | Matthews R R | 1 |
| Publication | Filing date | Title |
|---|---|---|
| TW200817849A | System using ozonated acetic anhydride to remove photoresist materials | |
| US5911837A | Process for treatment of semiconductor wafers in a fluid | |
| WO9508406A1 | Process and apparatus for the treatment of semiconductor wafers in a fluid | |
| US5429251A | Semiconductor wafer end effector | |
| US5464480A | Process and apparatus for the treatment of semiconductor wafers in a fluid |