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INPRIA CORP

Overview
  • Total Patents
    93
  • GoodIP Patent Rank
    16,873
  • Filing trend
    ⇩ 36.0%
About

INPRIA CORP has a total of 93 patent applications. It decreased the IP activity by 36.0%. Its first patent ever was published in 2010. It filed its patents most often in United States, Republic of Korea and Taiwan. Its main competitors in its focus markets optics, organic fine chemistry and semiconductors are KANAYA YUHO, ICHINOSE GO and CERMA PREC INC.

Patent filings per year

Chart showing INPRIA CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Jiang Kai 50
#2 Meyers Stephen T 48
#3 Keszler Douglas A 39
#4 Cardineau Brian J 32
#5 Anderson Jeremy T 30
#6 Telecky Alan J 29
#7 Grenville Andrew 28
#8 Edson Joseph B 22
#9 Earley William 19
#10 Anderson Jeremy 17

Latest patents

Publication Filing date Title
WO2021016229A1 Organometallic metal chalcogenide clusters and application to lithography
WO2021011367A1 Stabilized interfaces of inorganic radiation patterning compositions on substrates
WO2020210660A1 Organometallic photoresist developer compositions and processing methods
TW202016279A Patterned organometallic photoresists and methods of patterning
WO2019246254A1 Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
TW201943724A Tin dodecamers and radiation patternable coatings with strong EUV absorption
CA3080934A1 Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US2020241413A1 Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods
US2020239498A1 Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods
KR20200078518A Applications for organotin clusters, solutions of organotin clusters, and high-resolution patterning
US2019315781A1 Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US2019315782A1 Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
KR20190030231A Method for reducing metal residue in edge bead region from metal containing resist
CN108780739A Prepatterned Lithographic template, the technique based on the radiation pattern for using the template and the technique for forming the template
CN108351594A Organotin oxides hydroxide patterning composition, predecessor and patterning
WO2016065120A1 Organometallic solution based high resolution patterning compositions and corresponding methods
US2015056542A1 Organometallic solution based high resolution patterning compositions
TW201222144A Patterned inorganic layers, radiation based patterning compositions and corresponding methods
US2011206599A1 Metal chalcogenide aqueous precursors and processes to form metal chalcogenide films