DYNAMIC MICROSYSTEMS SEMICONDU has a total of 20 patent applications. Its first patent ever was published in 2003. It filed its patents most often in Republic of Korea, Germany and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets semiconductors, chemical engineering and machines are MATTSON WET PRODUCTS GMBH, YIELDUP INTERNATIONAL and DYNAMIC MICROSYSTEMS SEMICONDUCTOR EQUIPMENT GMBH.
# | Country | Total Patents | |
---|---|---|---|
#1 | Republic of Korea | 6 | |
#2 | Germany | 5 | |
#3 | WIPO (World Intellectual Property Organization) | 5 | |
#4 | China | 2 | |
#5 | EPO (European Patent Office) | 2 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Chemical engineering | |
#3 | Machines | |
#4 | Computer technology | |
#5 | Optics | |
#6 | Control | |
#7 | Packaging and shipping |
# | Name | Total Patents |
---|---|---|
#1 | Moran Thomas J | 8 |
#2 | Rebstock Lutz | 8 |
#3 | Barker David | 3 |
#4 | Moran Thomas | 2 |
#5 | Meichsner Michael | 2 |
#6 | Tabrizi Farzad | 2 |
#7 | Lutz Rebstock | 1 |
#8 | Lobianco Robert | 1 |
#9 | Michael Meichsner | 1 |
#10 | Mantripragada Sai | 1 |
Publication | Filing date | Title |
---|---|---|
DE102005030275A1 | Method for cleaning or drying pot-like hollow bodies involves flushing head with outer shape, which is largely complementary to the inner shape of the interior is introduced into the interior | |
WO2005001888A2 | Device and method for cleaning objects used to produce semiconductors, especially transport and cleaning containers for wafers | |
DE10347464A1 | Apparatus and method for cleaning and drying semiconductor products or handling baskets used in the manufacture of semiconductor products | |
DE10330907A1 | Apparatus and method for processing a mask template for semiconductor fabrication | |
DE10329868A1 | Storage system for wafers | |
DE10317275A1 | System for cleaning of equipment used manufacture of semiconductors, using liquid in treatment chamber for cleaning, followed by drying, treatment chamber contains members for moving gases in chamber |